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Advances in Materials Research
  Volume 2, Number 4, December 2013, pages 195-208
DOI: http://dx.doi.org/10.12989/amr.2013.2.4.195
 

A theoritical study on spin coating technique
M.D. Tyona

 
Abstract     [Full Text]
    A comprehensive theory of the spin coating technique has been reviewed and the basic principles and parameters controlling the process are clearly highlighted, which include spin speed, spin time, acceleration and fume exhaust. The process generally involves four stages: a dispense stage, substrate acceleration stage, a stage of substrate spinning at a constant rate and fluid viscous forces dominate fluid thinning behaviour and a stage of substrate spinning at a constant rate and solvent evaporation dominates the coating thinning behaviour. The study also considered some common thin film defects associated with this technique, which include comet, striation, chucks marks environmental sensitivity and edge effect and possible remedies.
 
Key Words
    substrate; centrifugal force; spin coating; thin film; photolithography; acceleration
 
Address
M.D. Tyona: Department of Physics, Benue State University, Makurdi, Nigeria
 

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